Through-focus technique for grating linewidth analysis with nanometer sensitivity

Optical Engineering

Volumn 45, Issue 12, 2006, Pages

  Ku, Yi Sha ^a   Liu, An Shun ^a   Smith, Nigel ^b  

^a INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^b Accent Optical Technologies   (Taiwan)

Author keywords

Critical dimension; Defocus; Focus metrics; Resolution limit; Through focus

Indexed keywords

FOCUSING; IMAGE QUALITY; MATHEMATICAL MODELS; OPTICAL RESOLVING POWER; PHOTOSENSITIVITY;

DEFOCUS; FOCUS METRICS; NANOMETER SENSITIVITY; RESOLUTION LIMIT;

DIFFRACTION GRATINGS;

EID: 33947245102     PISSN: 00913286     EISSN: 15602303     Source Type: Journal    
DOI: 10.1117/1.2404959     Document Type: Article

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