Through-focus algorithm to improve overlay tool performance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5908, Issue , 2005, Pages 1-9

  Liu, An Shun ^a   Ku, Yi Sha ^a   Smith, Nigel ^b  

^a INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^b Accent Optical Technologies   (Taiwan)

Author keywords

Critical dimension; Defocus; Focus metrics; Resolution limit; Through focus

Indexed keywords

OPTICAL IMAGE STORAGE; OPTICAL RESOLVING POWER; PARAMETER ESTIMATION; PROBLEM SOLVING;

CRITICAL DIMENSION; DEFOCOUS; FOCUS METRICS; RESOLUTION LIMIT; THROUGH FOCUS;

ALGORITHMS;

EID: 30644458748     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.616422     Document Type: Conference Paper

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