Usage of overlay metrology simulator in design of overlay metrology tools for the 65nm node and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5375, Issue PART 1, 2004, Pages 254-265

  Simovitch, Yariv ^a   Gov, Shahar ^a  

^a Nova Measuring Instruments Ltd   (Israel)

Author keywords

Aberrations; Modeling; Overlay; Simulation; TIS

Indexed keywords

IMAGE PROCESSING OVERPLAY (IPOL); OVERLAY; OVERLAY METROLOGY; TOOL INDUCED SHIFT (TIS);

ABERRATIONS; COMPUTER SIMULATION; EDGE DETECTION; ETCHING; IMAGE PROCESSING; IMAGING SYSTEMS; LIGHTING; MATHEMATICAL TRANSFORMATIONS; PROBLEM SOLVING; SCATTERING; SILICON; SPECTRUM ANALYSIS;

SIMULATORS;

EID: 4344588067     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535400     Document Type: Conference Paper

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