Formation of (001)-textured grain in (111) polycrystalline silicon film

Thin Solid Films

Volumn 515, Issue 12, 2007, Pages 5054-5058

  Oh, Jae Hwan ^a   Kim, Eun Hyun ^a   Kang, Dong Han ^a   Cheon, Jun hyuk ^a   Kim, Kyung Ho ^a   Jang, Jin ^a  

^a Kyung Hee University   (South Korea)

Author keywords

Crystallization; Polycrystalline silicon; Thin film transistor

Indexed keywords

AMORPHOUS SILICON; BACKSCATTERING; CRYSTALLIZATION; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYSILICON;

BACKSCATTERED DIFFRACTION; NUCLEATION RATE; POLYCRYSTALLINE SILICON FILM; TEXTURED GRAINS;

GRAIN GROWTH;

EID: 33947148572     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.10.084     Document Type: Article

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