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Volumn 12, Issue 4, 2004, Pages 493-509

Programmable thermal processing module for semiconductor substrates

Author keywords

[No Author keywords available]

Indexed keywords

LINEAR QUADRATIC REGULATOR; PHOTOMASKS; PROGRAMMABLE THERMAL PROCESSING MODULE; SEMICONDUCTOR SUBSTRATES; SEMICONDUCTOR WAFER; THERMAL MASS;

EID: 4344682782     PISSN: 10636536     EISSN: None     Source Type: Journal    
DOI: 10.1109/TCST.2004.824775     Document Type: Article
Times cited : (20)

References (18)
  • 1
    • 0031333743 scopus 로고    scopus 로고
    • Use of exposure compensation to improve device performance for speed and binning based on electrical parametric feedback into fabrication design
    • P. Ackmann, S. Brown, R. Edwards, D. Downey, K. Turnquest, and J. Nistler, "Use of exposure compensation to improve device performance for speed and binning based on electrical parametric feedback into fabrication design," SPIE, vol. 3051, pp. 384-390, 1997.
    • (1997) SPIE , vol.3051 , pp. 384-390
    • Ackmann, P.1    Brown, S.2    Edwards, R.3    Downey, D.4    Turnquest, K.5    Nistler, J.6
  • 3
    • 0031339246 scopus 로고    scopus 로고
    • Characterization of autofocus uniformity and precision on ASML steppers using phase shift focus monitor reticle
    • R. Edwards, P. Ackmann, C. Fischer, M. Desrocher, and M. Puzerewski, "Characterization of autofocus uniformity and precision on ASML steppers using phase shift focus monitor reticle," SPIE, vol. 3051, pp. 448-455, 1997.
    • (1997) SPIE , vol.3051 , pp. 448-455
    • Edwards, R.1    Ackmann, P.2    Fischer, C.3    Desrocher, M.4    Puzerewski, M.5
  • 5
    • 24644524731 scopus 로고    scopus 로고
    • Control of spatial and transient temperature trajectories for photoresist processing
    • K. El-Awady, C. Schaper, and T. Kailath, "Control of spatial and transient temperature trajectories for photoresist processing," J. Vacuum Sci. Technol. B, vol. 17, no. 5, pp. 2109-2114, 1999.
    • (1999) J. Vacuum Sci. Technol. B , vol.17 , Issue.5 , pp. 2109-2114
    • El-Awady, K.1    Schaper, C.2    Kailath, T.3
  • 8
    • 0000884222 scopus 로고
    • Correlation equations for free convection heat transfer in horizontal layers of air and water
    • K.G. Hollands, G. D. Raithby, and L. Konicek, "Correlation equations for free convection heat transfer in horizontal layers of air and water," Int. J. Heat Mass Transfer, vol. 18, pp. 879-884, 1975.
    • (1975) Int. J. Heat Mass Transfer , vol.18 , pp. 879-884
    • Hollands, K.G.1    Raithby, G.D.2    Konicek, L.3
  • 9
    • 4043051934 scopus 로고
    • Deep UV lithography in 16-MBIT dram manufacturing
    • S. Holmes and J. Sturtevant, "Deep UV lithography in 16-MBIT dram manufacturing," Microlithography World, no. 3, pp. 17-22, 1993.
    • (1993) Microlithography World , Issue.3 , pp. 17-22
    • Holmes, S.1    Sturtevant, J.2
  • 12
    • 0342779670 scopus 로고    scopus 로고
    • Modeling of solvent evaporation effects for hot plate baking of photoresist
    • C. Mack, D. Dewitt, B. Tsai, and G. Yetter, "Modeling of solvent evaporation effects for hot plate baking of photoresist," SPIE Adv. Resist Technol. Processing XI, vol. 2195, pp. 584-595, 1997.
    • (1997) SPIE Adv. Resist Technol. Processing XI , vol.2195 , pp. 584-595
    • Mack, C.1    Dewitt, D.2    Tsai, B.3    Yetter, G.4
  • 13
    • 2642537161 scopus 로고
    • Characterizing coat, bake, and develop processes
    • R. Mohondro and P. Gaboury, "Characterizing coat, bake, and develop processes," Solid State Technol., no. 7, pp. 87-90, 1993.
    • (1993) Solid State Technol. , Issue.7 , pp. 87-90
    • Mohondro, R.1    Gaboury, P.2
  • 14
    • 0031232635 scopus 로고    scopus 로고
    • Temperature metrology for CD control in DUV lithography
    • J. Parker and W. Renken, "Temperature metrology for CD control in DUV lithography," Semiconductor Int., vol. 20, no. 10, pp. 111-116, 1997.
    • (1997) Semiconductor Int. , vol.20 , Issue.10 , pp. 111-116
    • Parker, J.1    Renken, W.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.