Control systems for the nanolithography process

Proceedings of the IEEE Conference on Decision and Control

Volumn 4, Issue , 1999, Pages 4173-4178

  Schaper, Charles D ^a   El Awady, Khalid ^a   Tay, Arthur ^a   Kailath, Thomas ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; INTEGRATED CIRCUIT MANUFACTURE; LITHOGRAPHY; MASKS; NANOTECHNOLOGY; PHOTORESISTS; TEMPERATURE CONTROL;

CHEMICALLY AMPLIFIED PHOTORESISTS; LASER INTERFEROMETRY; NONCONVENTIONAL NEXT GENERATION LITHOGRAPHY; OPTICAL EXPOSURE PROCESS; OPTICAL MASK PREPARATION;

PROCESS CONTROL;

EID: 0033312274     PISSN: 01912216     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (17)