Optimizing CD uniformity by total PEB cycle temperature control on track equipment

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4690 II, Issue , 2002, Pages 754-760

  Hisai, Akihiro ^a   Kaneyama, Koji ^a   Pieczulewski, Charles ^a,b  

^a DAINIPPON SCREEN MFG CO LTD   (Japan)

^b DNS Electronics ^*  (Japan)

Author keywords

CD uniformity; Post exposure bake (PEB); Temperature uniformity; Track equipment

Indexed keywords

ARGON; HEATING; KRYPTON; OPTIMIZATION; PHOTOLITHOGRAPHY; SILICON WAFERS; TEMPERATURE CONTROL;

WAFER CRITICAL DIMENSIONS;

PHOTORESISTS;

EID: 0036031573     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474276     Document Type: Article

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