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Volumn 201, Issue 15, 2007, Pages 6674-6677
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Effect of negative pulsed high-voltage-bias on diamond-like carbon thin film preparation using capacitively coupled radio-frequency plasma chemical vapor deposition
a
SAGA UNIVERSITY
(Japan)
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Author keywords
Capacitively coupled plasma; DLC film; Negative pulsed high voltage
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
ELASTIC MODULI;
HARDNESS;
MECHANICAL PROPERTIES;
NANOINDENTATION;
PLASMA APPLICATIONS;
THICK FILMS;
CAPACITIVELY COUPLED PLASMA;
NEGATIVE PULSED HIGH-VOLTAGE;
RADIO-FREQUENCY PLASMA;
DIAMOND LIKE CARBON FILMS;
CHEMICAL VAPOR DEPOSITION;
DIAMOND LIKE CARBON FILMS;
ELASTIC MODULI;
HARDNESS;
MECHANICAL PROPERTIES;
NANOINDENTATION;
PLASMA APPLICATIONS;
THICK FILMS;
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EID: 33847370760
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2006.09.057 Document Type: Article |
Times cited : (6)
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References (10)
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