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Volumn 201, Issue 15, 2007, Pages 6674-6677

Effect of negative pulsed high-voltage-bias on diamond-like carbon thin film preparation using capacitively coupled radio-frequency plasma chemical vapor deposition

Author keywords

Capacitively coupled plasma; DLC film; Negative pulsed high voltage

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELASTIC MODULI; HARDNESS; MECHANICAL PROPERTIES; NANOINDENTATION; PLASMA APPLICATIONS; THICK FILMS;

EID: 33847370760     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.09.057     Document Type: Article
Times cited : (6)

References (10)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.