Shunting arc generation by co-axial electrode configuration

Surface and Coatings Technology

Volumn 136, Issue 1-3, 2001, Pages 36-39

  Yukimura, Ken ^a   Tani, Yuji ^a   Yoshioka, Kenji ^a  

^a DOSHISHA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANODES; CATHODES; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; ION BEAMS; ION IMPLANTATION;

PLASMA SOURCE ION IMPLANTATION (PSII); PLASMA-BASED ION IMPLANTATION (PBII); SHUNTING ARC;

PLASMA SOURCES;

EID: 0035254345     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)01006-9     Document Type: Article

References (2)

1. K. Yukimura, R. Isono, T. Monguchi, K. Yoshioka, S Masamune, J. Vac. Sci. Technol. 17 (1999) 871.
2. K. Yukimura, K. Yoshioka, Y. Tani, Rev. Sci. Instrum. 71 (2000) (in press).