Time-Averaged Energy Distribution Function of Ions Impacted on an RF-biased Substrate in Electron Cyclotron Resonance Microwave Plasma

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 12, 2003, Pages 7552-7556

  Ohtsu, Yasunori ^a   Yoshinaga, Kunihiro ^a   Fujita, Hiroharu ^a  

^a SAGA UNIVERSITY   (Japan)

Author keywords

Bimodal profile; Conventional retarding energy analyzer; Ion plasma frequency; Rf biased substrate; Time averaged ion energy distribution function

Indexed keywords

DATA REDUCTION; ELECTRIC POTENTIAL; ELECTRON CYCLOTRON RESONANCE; ELECTROSTATICS; ENERGY TRANSFER; MICROWAVES; PLASMA ETCHING; PLASMAS; PROBES; SECONDARY ION MASS SPECTROMETRY; SUBSTRATES;

BIMODAL PROFILE; CONVENTIONAL RETARDING ENERGY ANALYZER; ION PLASMA FREQUENCY; RF-BIASED SUBSTRATES; TIME-AVERAGED ION ENERGY DISTRIBUTION FUNCTION;

IMPACT IONIZATION;

EID: 1242332784     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.7552     Document Type: Article

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