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Volumn 300, Issue 1, 2007, Pages 251-253

Vacancy defect distribution in heteroepitaxial a-plane GaN grown by hydride vapor phase epitaxy

Author keywords

A1. Characterization; A1. Point defects; A3. Hydride vapor phase epitaxy; A3. Metalorganic chemical vapor deposition; B1. Nitrides; B2. Semiconducting gallium compounds

Indexed keywords

CONCENTRATION (PROCESS); DISLOCATIONS (CRYSTALS); EPITAXIAL GROWTH; GALLIUM NITRIDE; INTERFACES (MATERIALS); POSITRON ANNIHILATION SPECTROSCOPY; VAPOR PHASE EPITAXY;

EID: 33847335898     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2006.11.040     Document Type: Article
Times cited : (13)

References (17)
  • 17
    • 33847281118 scopus 로고    scopus 로고
    • R. Kroeger, private communication.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.