Nanoindentation characterization of ZnO thin films

Materials Science and Engineering: A

Volumn 452-453, Issue , 2007, Pages 715-720

  Fang, Te Hua ^a   Chang, Win Jin ^b   Lin, Chao Ming ^c  

^a NATIONAL FORMOSA UNIVERSITY   (Taiwan)

^b KUN SHAN UNIVERSITY   (Taiwan)

^c WUFENG INSTITUTE OF TECHNOLOGY   (Taiwan)

Author keywords

Mechanical properties; Thin films; X ray diffraction

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTALLOGRAPHY; ELASTIC MODULI; HARDNESS; NANOINDENTATION; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

INDENTATION LOAD; INDENTATION-LOADING TIME;

ZINC OXIDE;

ATOMIC FORCE MICROSCOPY; CRYSTALLOGRAPHY; ELASTIC MODULI; HARDNESS; NANOINDENTATION; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

EID: 33847290808     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.msea.2006.11.008     Document Type: Article

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