Surface chemistry and preferential crystal orientation on the H and Cl terminated silicon surface

Journal of Applied Physics

Volumn 101, Issue 3, 2007, Pages

  Shirai, H ^a   Saito, T ^a   Li, Y ^a   Matsui, H ^a   Kobayashi, T ^b  

^a SAITAMA UNIVERSITY   (Japan)

^b INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHLORINE; CRYSTAL ORIENTATION; HYDROGEN; METALLIC FILMS;

HYDROGENATED CHLORINATED CRYSTALLINE SILICON FILMS; PREFERENTIAL CRYSTAL ORIENTATION; THERMAL ABSTRACTION;

SURFACE CHEMISTRY;

EID: 33847120259     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2434826     Document Type: Article

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