Low-temperature Formation of Polycrystalline Silicon and its Device Application

Solid State Phenomena

Volumn 93, Issue , 2003, Pages 99-108

  Fujiwara, H ^a   Nasuno, Y ^a   Kondo, M ^a   Mutsuda, A ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Infrared Spectroscopy; Nucleation; Polycrystalline Silicon; Solar Cell; Spectroscopic Ellipsometry

Indexed keywords

AMORPHOUS SILICON; ELLIPSOMETRY; HYDROGENATION; INFRARED SPECTROSCOPY; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SUBSTRATES;

CONVERSION EFFICIENCY;

POLYSILICON;

EID: 0242497241     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/ssp.93.99     Document Type: Conference Paper

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