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Volumn 3, Issue 7, 2006, Pages 33-44

Electron transport in engineered substrates: Strain, orientation, and channel/insulator material effects

Author keywords

[No Author keywords available]

Indexed keywords

CHANNEL CAPACITY; FIELD EFFECT TRANSISTORS; LEAKAGE CURRENTS; STRAIN MEASUREMENT; SUBSTRATES; ZENER EFFECT;

EID: 33847003386     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2355792     Document Type: Conference Paper
Times cited : (3)

References (24)
  • 1
    • 11144358507 scopus 로고    scopus 로고
    • IEEE, New York
    • K. Rim et al., in VLSI Symp. Tech. Dig., p. 98-9, IEEE, New York, (2002).
    • (2002) VLSI Symp. Tech. Dig , pp. 98-99
    • Rim, K.1
  • 3
    • 33846986967 scopus 로고    scopus 로고
    • IEEE, New York
    • H. Shang et al., in VLSI Symp. Tech. Dig., p. 204-5, IEEE, New York, (2004).
    • (2004) VLSI Symp. Tech. Dig , pp. 204-205
    • Shang, H.1
  • 12
    • 33846970085 scopus 로고    scopus 로고
    • P. M. Solomon and S. E. Laux, in IEDM Tech. Dig., p. 5.1.1-4, IEEE, Piscataway, NJ (2001).
    • P. M. Solomon and S. E. Laux, in IEDM Tech. Dig., p. 5.1.1-4, IEEE, Piscataway, NJ (2001).
  • 20
    • 33846959979 scopus 로고    scopus 로고
    • 34(7), 665 (1958).
    • 34(7), 665 (1958).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.