Germanium... the semiconductor of tomorrow?

AIP Conference Proceedings

Volumn 866, Issue , 2006, Pages 3-8

  Peaker, A R ^a   Satta, A ^b   Markevich, V P ^a   Simoen, E ^b   Hamilton, B ^a  

^a UNIVERSITY OF MANCHESTER   (United Kingdom)

^b IMEC   (Belgium)

Author keywords

CMOS; Dopant activation; Germanium; Ion implantation; Semiconductor defects

Indexed keywords

EID: 33846949375     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2401448     Document Type: Conference Paper

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