Mapping stress and strain in nanostructures by high-resolution transmission electron microscopy

Microelectronic Engineering

Volumn 84, Issue 3, 2007, Pages 460-463

  Hytch M J ^a   Houdellier, F ^a  

^a CEMES CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DEFORMATION; SIGNAL TO NOISE RATIO; STRAIN MEASUREMENT; STRESS ANALYSIS; TRANSMISSION ELECTRON MICROSCOPY;

GEOMETRIC PHASE ANALYSIS (GPA); HIGH-RESOLUTION TRANSMISSION ELECTRON MICROSCOPY (HRTEM); NANOMETRE SCALE RESOLUTION;

NANOSTRUCTURED MATERIALS;

EID: 33846937525     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.10.062     Document Type: Article

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