Effect of thermal annealing on the optical properties and residual stress of TiO2 films produced by ion-assisted deposition

Applied Optics

Volumn 44, Issue 15, 2005, Pages 2996-3000

  Lee, Cheng Chung ^a   Chen, Hsi Chao ^a   Jaing, Cheng Chung ^b  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^b MINGHSIN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

BINDING ENERGY; DEPOSITION; INTERFEROMETERS; INTERFEROMETRY; OXYGEN; RAPID THERMAL ANNEALING; REFRACTIVE INDEX; RESIDUAL STRESSES; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

HIGH-INDEX FILMS; ION-ASSISTED DEPOSITION; SUBOXIDES; TWYMAN-GREEN INTERFEROMETERS;

THIN FILMS;

EID: 20444433877     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.44.002996     Document Type: Article

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