A new nonlinear-micro-contact model for single particle in the chemical-mechanical polishing with soft pad

Journal of Materials Processing Technology

Volumn 183, Issue 2-3, 2007, Pages 374-379

  Wang, Yongguang ^a   Zhao, Yong Wu ^a   Gu, Jian ^a  

^a JIANGNAN UNIVERSITY   (China)

Author keywords

Chemical mechanical polishing; Nonlinear; Single particle; Soft pad

Indexed keywords

DEFORMATION; MATHEMATICAL MODELS; NONLINEAR EQUATIONS; SLURRIES;

MICRO-CONTACT FORCE; SINGLE PARTICLES; SOFT PAD;

CHEMICAL MECHANICAL POLISHING;

EID: 33846848044     PISSN: 09240136     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmatprotec.2006.10.030     Document Type: Article

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