Polishing mechanism of tantalum films by SiO2 particles

Microelectronic Engineering

Volumn 70, Issue 1, 2003, Pages 93-101

  Vijayakumar, A ^a,b   Du, T ^a   Sundaram, K B ^a,b   Desai, V ^a  

^a Advanced Materials Processing and Analysis Center   (United States)

^b UNIVERSITY OF CENTRAL FLORIDA   (United States)

Author keywords

Chemical mechanical polishing; Electrochemistry; Tantalum; X Ray photoelectron spectroscopy

Indexed keywords

CHEMICAL MECHANICAL POLISHING; ELECTROCHEMISTRY; IONIZATION; PERMITTIVITY; SILICA; SURFACE STRUCTURE; X RAY PHOTOELECTRON SPECTROSCOPY;

SURFACE FILMS;

TANTALUM;

EID: 0141865752     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00398-8     Document Type: Article

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