Probable role of abrasion in chemo-mechanical polishing of tungsten

Wear

Volumn 233-235, Issue , 1999, Pages 647-654

  Larsen Basse, J ^a   Liang, H ^b  

^a NATIONAL SCIENCE FOUNDATION   (United States)

^b Cabot   (United States)

Author keywords

Abrasion; Chemo mechanical polishing; Tungsten

Indexed keywords

CHEMICAL POLISHING; DEFECTS; DIELECTRIC FILMS; ELECTROCHEMISTRY; INTEGRATED CIRCUIT MANUFACTURE; PH EFFECTS; SURFACES; TUNGSTEN;

CHEMOMECHANICAL PROCESSING; LOW PH SLURRY; PLANARIZATION EFFECT;

ABRASION;

ABRASION; POLISHING; TUNGSTEN;

EID: 0033391209     PISSN: 00431648     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0043-1648(99)00248-3     Document Type: Conference Paper

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