Fabrication of the electroless NiMoB films as a diffusion barrier layer on the low-k substrate

ECS Transactions

Volumn 1, Issue 11, 2006, Pages 57-67

  Yoshino, Masahiro ^a   Masuda, Toyoto ^a   Wakatsuki, Satoshi ^a   Sasano, Junji ^a   Matsuda, Itsuaki ^a   Shacham Diamand, Yosi ^a   Osaka, Tetsuya ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIELECTRIC MATERIALS; DIFFUSION; ELECTROLESS PLATING; FILM GROWTH; SCANNING ELECTRON MICROSCOPY; SUBSTRATES;

DEPOSITION RATE; SELECTIVE DEPOSITION; SELF-ASSEMBLED MONOLAYERS (SAM);

THIN FILMS;

EID: 33846845084     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2218478     Document Type: Conference Paper

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