Hard and superhard TiAlBN coatings deposited by twin electron-beam evaporation

Surface and Coatings Technology

Volumn 201, Issue 13, 2007, Pages 6078-6083

  Rebholz, C ^a   Monclus, M A ^b   Baker, M A ^b   Mayrhofer, P H ^c   Gibson, P N ^d   Leyland, A ^e   Matthews, A ^e  

^a UNIVERSITY OF CYPRUS   (Cyprus)

^b UNIVERSITY OF SURREY   (United Kingdom)

^c UNIVERSITY OF LEOBEN   (Austria)

^d JOINT RESEARCH CENTRE   (Italy)

^e UNIVERSITY OF SHEFFIELD   (United Kingdom)

Author keywords

Electron beam evaporation; Nanoindentation; Physical vapour deposition (PVD); Superhard nanocomposites; Thermal stability

Indexed keywords

HARDNESS; HOT ISOSTATIC PRESSING; INDENTATION; NANOSTRUCTURED MATERIALS; PHYSICAL VAPOR DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; STOICHIOMETRY;

NANOINDENTATION; SUPERHARD NANOCOMPOSITES; SUPERHARD NANOSTRUCTURED COATINGS; TWIN ELECTRON-BEAM EVAPORATION;

POWDER COATINGS;

HARDNESS; HOT ISOSTATIC PRESSING; INDENTATION; NANOSTRUCTURED MATERIALS; PHYSICAL VAPOR DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POWDER COATINGS; STOICHIOMETRY;

EID: 33846829972     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.08.121     Document Type: Article

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