Atomic layer deposition of Ru by using a new Ru-precursor

ECS Transactions

Volumn 2, Issue 4, 2006, Pages 1-11

  Song, Y W ^a   Lee, J ^a   Leg, K ^a   Lee, Y ^a   Jang, H K ^b  

^a Korea Polytechnic University   (South Korea)

^b R and D Center   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; DEPOSITION; ELECTRODES; SILICON WAFERS; VACUUM APPLICATIONS;

CARRIER GAS; MULTICHANNEL SHOWER HEADS; PURGE GAS;

RUTHENIUM;

EID: 33846803985     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2204812     Document Type: Conference Paper

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