Structure and electrical properties of thin Ta2O5 deposited on metal electrodes

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 3 SUPPL. B, 1998, Pages 1336-1339

  Kishiro, Koichi ^a   Inoue, Nobuhiko ^a   Chen, Shih Chang ^a   Yoshimaru, Masaki ^a  

^a OKI ELECTRIC INDUSTRY CO   (Japan)

Author keywords

Crystallinity; Dielectric; DRAM; Metal electrode; Orientation; Storage capacitor; Ta2O5

Indexed keywords

EID: 0001654340     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.1336     Document Type: Article

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