Research on the properties of ZnO thin films deposited by using filtered cathodic arc plasma technique on glass substrate under different flow rate of O 2

Applied Surface Science

Volumn 253, Issue 8, 2007, Pages 4000-4005

  Li, C ^a   Li, X C ^a   Yan, P X ^a,b   Chong, E M ^a   Liu, Y ^a   Yue, G H ^a   Fan, X Y ^a  

^a LANZHOU UNIVERSITY   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

Electrical resistivity; Filtered cathodic arc plasma; Photoluminescence; Tensile stress; ZnO thin films

Indexed keywords

ELECTRIC CONDUCTIVITY; OXYGEN SUPPLY; PHOTOLUMINESCENCE; PLASMAS; SUBSTRATES; TENSILE STRESS; ZINC OXIDE;

FILTERED CATHODIC ARC PLASMA; LUMINESCENT BANDS; ZNO THIN FILMS;

THIN FILMS;

EID: 33846643527     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.08.048     Document Type: Article

References (29)

1. Look D.C., Hemsky J.W., and Sizelove J.R. Phys. Rev. Lett. 82 (1999) 2552
2. Miyata T., Minami T., Saikai K., and Takata S. J. Lumin. 60/61 (1994) 926
3. Matsumoto Y., Hirata G.A., Takakura H., Okamoto H., and Hamakawa Y. J. Appl. Phys. 67 (1990) 6538
4. Mareska H.P., Parodos T., Kalkhoraud N.M., and Halverson W.D. Mater. Res. Soc. Symp. Proc. 345 (1994) 269
5. Lampe U., and Muller J. Sensor. Actuator. 18 (1989) 269
6. Bougrine A., Addou M., Kachouane A., Bérnède J.C., and Morsli M. Mater. Chem. Phys. 91 (2005) 247
7. Hahn B., Heubedl G., Pschorr-Schoberer E., et al. Semicond. Sci. Technol. 13 (1998) 788
8. Igasaki Y., Ishikawa M., and Shimaoka G. Appl. Surf. Sci. 33/34 (1988) 926
9. Lu Y.M., Hwang W.S., Liu W.Y., and Yang J.S. Mater. Chem. Phys. 72 (2001) 269
10. Minami T., Nanto H., Shooji S., and Tanaka S. Thin Solid Films 111 (1984) 167
11. Ghandi S.K., Field R.J., and Shelly J.R. Appl. Phys. Lett. 37 (1980) 449
12. Chen I.Q., Yamamoto S., Kawasuso A., Xu Y., and Sekiguchi T. Appl. Surf. Sci. 244 (2005) 377
13. Izyumskaya N., Avrutin V., Schoch W., El-Shaer S., ReuB F., Gruber T., and Waag A. J. Cryst. Growth 269 (2004) 356
14. Yoon J.S., and Han J.G. Surf. Coat. Technol. 94 (1997) 201-206
15. Kimura K., Izumi K., Takikawa I.I., and Sakakibara T. Vacuum 59 (2000) 159-167
16. Xu X.L., Lau S.P., Chen J.S., Chen G.Y., and Tay B.K. J. Cryst. Growth 223 (2001) 201
17. Anders A. Surf. Coat. Technol. 120 (1999) 319-330
18. Boxman R.L., Zhitomirsky V., Alterkop B., Gidalevich E., Belis I., Keidar M., and Goldsmith S. Surf. Coat. Technol. 86 (1996) 243-253
19. Karpov D.A. Surf. Coat. Technol. 96 (1997) 22-23
20. Schuelke T., Witke T., Scheibe H.-J., Siemroth P., Schultrich B., Zimmer O., and Vetter J. Surf. Coat. Technol. 120 (1999) 226-232
21. Brown I.G. Annu. Rev. Mater. Sci. 28 (1998) 243-269
22. Sanders A.M., and Anders A. Review of cathodic arc deposition technology at the start of the new millennium. Proceedings of ICMCTF. San Diego. Surf. Coat. Technol. (April 2000)
23. Waits R.K. J. Sci. Technol. 15 (1978) 179
24. In: Vossen J.L., and Kern W. (Eds). Thin Film Processes (1978), Academic Press, New York (Chapter II-4)
25. Puchert M.K., Timbrell P.Y., and Lamb R.N. J. Vac. Sci. Technol. A 14 (1996) 2220
26. Hua H.Z., et al. Analysis of Nanostructrue Materials (2003), Chemical Industry Press, Beijing p. 244
27. Kim K.H., Park K.C., and Ma D.Y. J. Appl. Phys. 81 (1997) 7764
28. Guo L., Yang S., Yang C., Yu P., Wang J., Ge W., and Wong G.K.L. Appl. Phys. Lett. 76 (2000) 2901
29. Y.M. Sun, Ph.D. Thesis, University of Science and Technology of China (2000).