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Volumn 5853 PART I, Issue , 2005, Pages 445-453

Application of a wafer development process to mask making

Author keywords

CD uniformity; Develop; E beam CAR; LD nozzle; Local loading; Photomask; Puddle process; SH nozzle

Indexed keywords

LOGIC CIRCUITS; MASKS; NOZZLES; SILICON WAFERS;

EID: 28544433515     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.617104     Document Type: Conference Paper
Times cited : (11)

References (8)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.