-
1
-
-
21144484817
-
Evaluation of a new-generation photomask develop system for CAR
-
R. Cantrell, M. Tschinkl, A. Feicke, W. Porsche, G. Lee, T. Kotoda, P. Tichy, T. Fukai, S. Kamei, and H. Asai, "Evaluation of a new-generation photomask develop system for CAR", 24th Annual BACUS Symposium on Photomask Technology, SPIE Vol. 5567, pp. 190-200, 2004
-
(2004)
24th Annual BACUS Symposium on Photomask Technology, SPIE
, vol.5567
, pp. 190-200
-
-
Cantrell, R.1
Tschinkl, M.2
Feicke, A.3
Porsche, W.4
Lee, G.5
Kotoda, T.6
Tichy, P.7
Fukai, T.8
Kamei, S.9
Asai, H.10
-
2
-
-
0141610911
-
Novel development method to improve critical dimensional control
-
A. Nishiya and K. Sakamoto, "Novel development method to improve critical dimensional control", Advances in Resist Technology and Processing XX, SPIE Vol. 5039, pp. 1343-1352, 2003
-
(2003)
Advances in Resist Technology and Processing XX, SPIE
, vol.5039
, pp. 1343-1352
-
-
Nishiya, A.1
Sakamoto, K.2
-
3
-
-
0141833922
-
Improvement of CD controllability in development process
-
H. Kyoda, A. Okouchi, H. Takeguchi, H. W. Kim, "Improvement of CD controllability in development process", Advances in Resist Technology and Processing XX, SPIE Vol. 5039, pp. 1353-1365, 2003
-
(2003)
Advances in Resist Technology and Processing XX, SPIE
, vol.5039
, pp. 1353-1365
-
-
Kyoda, H.1
Okouchi, A.2
Takeguchi, H.3
Kim, H.W.4
-
4
-
-
19844367631
-
High flow rate development: Process optimization using megasonic immersion development (MID)
-
D. Courboin, J. W. Choi, S. H. Jung, S. H. Baek, and L. J. Kim, "High flow rate development: process optimization using megasonic immersion development (MID)", 24th Annual BACUS Symposium on Photomask Technology, SPIE Vol. 5567, pp. 220-233, 2004
-
(2004)
24th Annual BACUS Symposium on Photomask Technology, SPIE
, vol.5567
, pp. 220-233
-
-
Courboin, D.1
Choi, J.W.2
Jung, S.H.3
Baek, S.H.4
Kim, L.J.5
-
5
-
-
11844296778
-
Improvement of develop loading effect in the FEP-171 process
-
T. J. Ha, Y. M. Lee, B. K. Choi, Y. Choi, and O. Han, "Improvement of develop loading effect in the FEP-171 process", 24th Annual BACUS Symposium on Photomask Technology, SPIE Vol. 5446, pp. 118-127, 2004
-
(2004)
24th Annual BACUS Symposium on Photomask Technology, SPIE
, vol.5446
, pp. 118-127
-
-
Ha, T.J.1
Lee, Y.M.2
Choi, B.K.3
Choi, Y.4
Han, O.5
-
6
-
-
11844273304
-
Investigations on microloading effect: A parallel approach to PGSD (proximity gap suction development)
-
D. Courboin, J. W. Choi, S. H. Jung, S. H. Back, and L. J. Kim, "Investigations on microloading effect: a parallel approach to PGSD (proximity gap suction development)", 24th Annual BACUS Symposium on Photomask Technology, SPIE Vol. 5446, pp. 106-117, 2004
-
(2004)
24th Annual BACUS Symposium on Photomask Technology, SPIE
, vol.5446
, pp. 106-117
-
-
Courboin, D.1
Choi, J.W.2
Jung, S.H.3
Back, S.H.4
Kim, L.J.5
-
7
-
-
0037627682
-
Performance of proximity gap suction development (PGSD)
-
H. Sakurai, M. Itoh, Y. Esaki, K. Ooishi, K. Sakamoto, M. Nakao, T. Nishimura, H. Miyashita, and N. Hayashi, "Performance of Proximity Gap Suction Development (PGSD)", 22nd Annual BACUS Symposium on Photomask Technology, SPIE Vol. 4889, pp. 737-745, 2002
-
(2002)
22nd Annual BACUS Symposium on Photomask Technology, SPIE
, vol.4889
, pp. 737-745
-
-
Sakurai, H.1
Itoh, M.2
Esaki, Y.3
Ooishi, K.4
Sakamoto, K.5
Nakao, M.6
Nishimura, T.7
Miyashita, H.8
Hayashi, N.9
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