Novel development method to improve critical dimension control

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 II, Issue , 2003, Pages 1343-1352

  Nishiya, Akira ^a   Sakamoto, Kazuo ^a  

^a TOKYO ELECTRON LTD   (Japan)

Author keywords

CD; CD uniformity; Developer; Development method; Dissolution products; KrF

Indexed keywords

CRITICAL DIMENSION CONTROL; DISSOLUTION PRODUCTS;

DISSOLUTION; OPTICAL PROPERTIES; OPTICAL VARIABLES MEASUREMENT; PHOTORESISTS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0141610911     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485059     Document Type: Conference Paper

References (3)

1. Teruhiko Kumada, Hiroaki Sumitani and Yasuji Matsui, "Suppression of Pattern Edge Roughness by Low Ion Strength Developer", Journal of Photopolymer Science and Technology, Volume 14, Number 4, 519-522, 2001
2. Kazuo Sakamoto, "Novel Development Method for CD Control -Optimized Spin-off Develop Method-", SPIE Proceedings 4690, p782-792, 2002
3. Shinichi Ito, Kei Hayasaki and Hiroko Nakamura, "Dissolution performance of device pattern with low-impact development", SPIE Proceedings 4345, p665-672, 2001