MEMS-based gray-scale lithography

2001 International Semiconductor Device Research Symposium, ISDRS 2001 - Proceedings

Volumn , Issue , 2001, Pages 182-185

  Waits, C M ^a,b   Ghodssi, R ^a   Ervin, M H ^b   Dubey, M ^b  

^a UNIVERSITY OF MARYLAND   (United States)

^b U S ARMY RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPIC ETCHING; ANISOTROPY; DRY ETCHING; FABRICATION; LITHOGRAPHY; PHOTOLITHOGRAPHY; PHOTORESISTS; SEMICONDUCTOR DEVICES; WET ETCHING;

ADDITIONAL FLEXIBILITIES; CRYSTALLOGRAPHIC ORIENTATIONS; FABRICATION TECHNOLOGIES; GRAY-SCALE LITHOGRAPHY; INTEGRATED CIRCUIT FABRICATION; MICRO ELECTROMECHANICAL SYSTEM (MEMS); MICROSTEREOLITHOGRAPHY; WET ANISOTROPIC ETCHING;

MEMS;

EID: 84961785398     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ISDRS.2001.984470     Document Type: Conference Paper

References (5)

1. A. Bertsch, H. Lorenz and P. Renaud, "Combining Microstereolithography and thick resist UV lithography for 3D microfabrication", Proc. IEEE MEMS '98 Heidelberg, Germany, pp. 18-23, 1998.
2. A. A. Ayon, S. Nagle, L. Frechette, R. Ghodssi, A. Epstein and M. A. Schmidt, "Tailoring etch directionality in a deep reactive ion etching tool", Transducers '99 Sendai, Japan, pp. 854-857, 1999.
3. C. Beuret, G. A. Racine, J. Gobet, R. Luthier and N. F. de Rooij, "Microfabrication of 3D multidirectional inclined structures by UV lithography and electroplating", Proc. IEEE Micro Electro Mechanical Syst. MEMS 1994, Oiso, Japan, pp. 81-85, 1994
4. W. Henke, W. Hoppe, H. J. Quenzer, P. Staudt-Fischbach and B. Wagner, "Simulation and experimental study of gray-tone lithography for the fabrication of arbitrarily shaped surfaces, Proc. IEEE Micro Electro Mechanical Syst. MEMS 1994, Oiso, Japan, pp. 205-210.
5. J. R. Sheats and B. W. Smith, "Microlithography Science and Technology", Marcel Dekker, Inc., New York, 1998.