Investigation of structure and mechanical properties of magnetron sputtered monolayer and multilayer coatings in the ternary system Si-B-C

Surface and Coatings Technology

Volumn 201, Issue 9-11 SPEC. ISS., 2007, Pages 5564-5569

  Lattemann, M ^a,b   Ulrich, S ^b  

^a LINKÖPING UNIVERSITY   (Sweden)

^b KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

Amorphous multilayer thin films; B4C; Hardness enhancement; HRTEM; Magnetron sputtering; SiC

Indexed keywords

AMORPHOUS MATERIALS; COMPOSITION; HARDNESS; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; MULTILAYERS; TERNARY SYSTEMS; TOUGHNESS;

AMORPHOUS MULTILAYER THIN FILMS; HARDNESS ENHANCEMENT; MONOLAYER COATINGS; MULTILAYER COATINGS;

MONOLAYERS;

AMORPHOUS MATERIALS; COMPOSITION; HARDNESS; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; MONOLAYERS; MULTILAYERS; TERNARY SYSTEMS; TOUGHNESS;

EID: 33846489518     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.07.130     Document Type: Article

References (60)

1. Riedel R. Adv. Mater. 6 (1994) 549
2. Thevenot F. J. Eur. Ceram. Soc. 6 (1990) 205
3. Makowiecki D., Jankowski A., and Foreman R. J. Vac. Sci. Technol., A, Vac. Surf. Films 8 (1990) 3910
4. Blumstock G.M., and Keski-Kuha R. Appl. Opt. 33 (1994) 5962
5. Windt D.L., Gullikson E., and Walton C.C. Opt. Lett. 27 (2002) 2212
6. Buzhinskij O.J., and Semenets Y.M. Fusion Eng. Des. 45 (1999) 343
7. Eckhardt T., Bewilogua K., van der Kolk G., Hurkmans T., Trinh T., and Fleischer W. Surf. Sci. Technol. 126 (2000) 69
8. Lee S., Mazurowski J., Ramseyer G., and Dowben P.A. J. Appl. Phys. 72 (1992) 4925
9. Hwang S.-D., Byun D., Lanno N.J., Dowben P.A., and Kim H.R. Appl. Phys. Lett. 68 (1996) 1495
10. Onate J.I., Garcia A., Bellid V., and Viviente J.L. Surf. Coat. Technol. 49 (1991) 548
11. Tsai H.-S., Jaw G.-J., Chang S.-H., Cheng C.-C., Lee C.-T., and Liu H.-P. Surf. Coat. Technol. 132 (2000) 158
12. Shirai K., Emura S., Gonda S., and Kumashiro Y. J. Appl. Phys. 78 (1995) 3392
13. Brainard W.A., and Wheeler D.R. J. Vac. Sci. Technol. 15 (1978) 1800
14. Jankowski A.F., and Perry P.L. Thin Solid Films 206 (1991) 365
15. McKernan M.A. Surf. Coat. Technol. 49 (1991) 411
16. Chiang C.-I., Meyer O., and Holleck H. Solid State Commun. 99 (1996) 135
17. Ohring M. The Materials Science of Thin Films (1992), Academic Press, San Diego
18. Ulrich S., Theel T., Schwan J., Batori V., Scheib M., and Ehrhardt H. Diamond Relat. Mater. 6 (1997) 645
19. Sella C., Lecoeur J., Sampeur Y., and Catania P. Surf. Coat. Technol. 60 (1993) 557
20. Wasa K., Nagai T., and Hayakawa S. Thin Solid Films 31 (1976) 235
21. Knotek O., Loffer F., and Kramer G. Surf. Coat. Technol. 61 (1993) 320
22. Valentini A., Convertino A., Alvisi M., Cingolani R., Ligonzo T., Lamendola R., and Tapfer L. Thin Solid Films 335 (1998) 80
23. Zaytouni M., Riviere J.P., Denanot M.F., and Allain J. Thin Solid Films 287 (1996) 1
24. Minato K., Fukuda K., Ishikawa A., and Mita N. J. Nucl. Mater. 246 (1997) 215
25. Kim D.J., and Cho D.J. J. Am. Ceram. Soc. 79 (1996) 503
26. Sella C., Martin J.C., Lecoeur J., Le Chanu A., Harman M.F., and Davidas J.P. Mater. Sci. Eng., A Struct. Mater.: Prop. Microstruct. Process. 139 (1991) 49
27. Haghiri-Gosnet A.M., Rousseaux F., Kebabi B., Ladan F.R., Mayeux C., Madouri A., Decanini D., Nourneix J., Carcenac F., Launois H., Wisniewski B., Gat E., and Durand J. J. Vac. Sci. Technol., B 8 (1990) 1565
28. Cros B., Gat E., and Saurel J.M. J. Non-Cryst. Solids 209 (1997) 273
29. Riviere J. J. Phys. IV 10 (2000) 53
30. Peraud S., Villechaise P., Mendez J., and Delafond J. J. Mater. Sci. 34 (1999) 1003
31. Luo M.C., Li J.M., Wang Q.M., Sun G., Wang L., Li G.R., Zeng Y.P., and Lin L. J. Cryst. Growth 249 (2003) 1
32. Porada O.K., Ivashchenko V.I., Ivashchenko L.A., Rusakov G.V., Dub S.N., and Stegnij A.I. Surf. Coat. Technol. 180-181 (2004) 122
33. Costa A.K., Camargo S.S.J., Achete C.A., and Carius R. Thin Solid Films 377-378 (2000) 243
34. Ordine A., Achete C.A., Mattos O.R., Margarit I.C.P., Camargo S.S.J., and Hirsch T. Surf. Coat. Technol. 133-134 (2000) 583
35. Hall E.O. Proc. Phys. Soc. London, Sect. B 64 (1951) 747
36. Petch N.J. J. Iron Steel Inst. 174 (1953) 25
37. Jankowski A.F., and Tsakalakos T. J. Phys. F. Met. Phys. 15 (1985) 1279
38. Holleck H., and Schier V. Surf. Coat. Technol. 76-77 (1995) 328
39. Xu J., Gu M., and Li G. J. Mater. Sci. 3535 (2000) 35
40. Xu J., Kamiko M., Zhou Y., Lu G., Yamamoto R., Yu L., and Kojima I. Appl. Phys. Lett. 81 (2002) 1189
41. Embury J.D., and Hirth J. Acta Metall. Mater. 42 (1994) 2051
42. Misra A., Verdier M., Lu Y.C., Kung H., Mitchell T.E., Nastasi M., and Embury J.D. Scr. Mater. 39 (1998) 555
43. Lu Y.C., Kung H., Griffin A.J., Nastasi M.A., and Mitchell T.E. J. Mater. Res. 12 (1997) 1939
44. Anderson P.M., Foecke T., and Hazzledine P.M. MRS Bull. 24 (1999) 27
45. Koehler J.S. Phys. Rev., B 2 (1970) 547
46. Lehoczky S.L. Phys. Rev. Lett. 41 (1978) 1814
47. Lehoczky S.L. J. Appl. Phys. 49 (1978) 5479
48. Shinn M., and Barnett S.A. Appl. Phys. Lett. 64 (1994) 61
49. Oliver W.C., and Pharr G.M. J. Mater. Res. 7 (1992) 1564
50. Jaccodine R.J., and Schlegel W.A. J. Appl. Phys. 37 (1966) 2429
51. Chehaidar A., Zwick A., and Carles R. J. Phys., Condens. Matter 13 (2001) 10743
52. Hobert H., Dunken H., Urban S., Falk F., and Stafast H. Vibr. Spectrosc. 29 (2002) 177
53. Simeone D., Mallet C., Dubuisson P., Baldinozzi G., Gervais C., and Maquet J. J. Nucl. Mater. 277 (2000) 1
54. Tallant D.R., Aselage T.L., Campbell A.N., and Emin D. Phys. Rev., B. 40 (1989) 5649
55. Engström C., Birch J., Hultman L., Lavoie C., Cabral C., Jordan-Sweet J.L., and Carlsson J.R.A. J. Vac. Sci. Technol., A, Vac. Surf. Films 17 (1999) 2920
56. Vella J.B., Mann A.B., Kung H., Chien C.L., Weihs T.P., and Cammarata R.C. J. Mater. Res. 19 (2004) 1840
57. Gilman J.J. J. Appl. Phys. 44 (1973) 675
58. Cahn J. Acta Metall. 11 (1963) 1275
59. Lattemann M., Ulrich S., Holleck H., Stüber M., and Leiste H. Diamond Relat. Mater. 11 (2002) 1248
60. Lattemann M., Ulrich S., Leiste H., Nold E., and Holleck H. Appl. Phys., A 78 (2004) 659