Structural, electrical and optical properties of GZO/HfO2/GZO transparent MIM capacitors

Materials Science in Semiconductor Processing

Volumn 9, Issue 6, 2006, Pages 1119-1124

  Ahn, Byung Du ^a   Kim, Jong Hoon ^a   Kang, Hong Seong ^a   Lee, Choong Hee ^a   Oh, Sang Hoon ^a   Kim, Gun Hee ^a   Li, Dong Hua ^a   Lee, Sang Yeol ^a  

^a Yonsei University   (South Korea)

Author keywords

Ga doped ZnO; HfO2; Transparent capacitor

Indexed keywords

ELECTRIC PROPERTIES; LEAKAGE CURRENTS; MIM DEVICES; OPTICAL PROPERTIES; PULSED LASER DEPOSITION; THIN FILMS;

DIELECTRIC LAYERS; GA DOPED ZNO; GLASS SUBSTRATES; TRANSPARENT CAPACITORS;

CAPACITORS;

EID: 33846111676     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2006.10.030     Document Type: Article

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