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Volumn 47, Issue 3-4, 2007, Pages 529-536

ELID grinding of silicon wafers: A literature review

Author keywords

Electrolytic in process dressing; Grinding; Machining; Semiconductor material; Silicon wafer

Indexed keywords

GRINDING (MACHINING); INTEGRATED CIRCUITS; SEMICONDUCTOR MATERIALS; WHEEL DRESSING;

EID: 33845452723     PISSN: 08906955     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijmachtools.2006.06.001     Document Type: Article
Times cited : (56)

References (41)
  • 1
    • 33845382121 scopus 로고    scopus 로고
    • C.L. Chao, K.J. Ma, S.C. Sheu, H.Y. Lin, F.Y. Chang, Investigation of the surface integrity of precision machined single crystal silicon, in: Proceedings of the 15th Annual Meeting of The American Society for Precision Engineering, October 22-27, 22, 2000, pp. 82-85.
  • 2
    • 33845460424 scopus 로고    scopus 로고
    • M. Tricard, S. Kassir, P. Herron, Z.J. Pei, New abrasive trends in manufacturing of silicon wafers, in: Proceedings of Silicon Machining Symposium, American Society of Procesion Engineering, St. Louis, MO, USA, 1998.
  • 4
    • 0029403766 scopus 로고
    • Fracture strength of large diameter silicon wafers
    • Bawa M.S., Petro E.F., and Grimes H.M. Fracture strength of large diameter silicon wafers. Semiconductor International 18 11 (1995) 115-118
    • (1995) Semiconductor International , vol.18 , Issue.11 , pp. 115-118
    • Bawa, M.S.1    Petro, E.F.2    Grimes, H.M.3
  • 5
    • 33845418185 scopus 로고    scopus 로고
    • T. Fukami, H. Masumura, K. Suzuki, H. Kudo, Method of manufacturing semiconductor mirror wafers, European Patent Application EP96111698.5, 1997.
  • 7
    • 33845462738 scopus 로고    scopus 로고
    • R. Vandamme, Y. Xin, Z.J. Pei, Method of processing semiconductor wafers, US Patent 6,114,245, 2000.
  • 8
    • 0031322454 scopus 로고    scopus 로고
    • K. Carlisle, M.A. Stocker, Cost-effective machining of brittle materials (glasses and ceramics) eliminating/minimizing the polishing process, in: Proceedings of The International Society for Optical Engineering 3099 (1997) 46-58.
  • 9
    • 0029231067 scopus 로고
    • Analysis of mirror surface generation of hard and brittle materials by ELID (electronic in-process dressing) grinding with superfine grain metallic bond wheels
    • Ohmori H., and Nakagawa T. Analysis of mirror surface generation of hard and brittle materials by ELID (electronic in-process dressing) grinding with superfine grain metallic bond wheels. Annals of CIRP 44 1 (1995) 287-290
    • (1995) Annals of CIRP , vol.44 , Issue.1 , pp. 287-290
    • Ohmori, H.1    Nakagawa, T.2
  • 10
    • 33845421374 scopus 로고    scopus 로고
    • H. Ohmori, Method and apparatus for grinding with electrolytic dressing, US Patent 5,547,414, 1996.
  • 12
    • 33845431443 scopus 로고    scopus 로고
    • R. Murata, K. Okano, C. Tsutsumi, Grinding of structural ceramics, Proceedings of the Milton C. Shaw Grinding Symposium, PED, Vol. 16, 1985, pp. 261-272.
  • 13
    • 58149208117 scopus 로고
    • Mirror surface grinding of silicon wafers with electrolytic in-process dressing
    • Ohmori H., and Nakagawa T. Mirror surface grinding of silicon wafers with electrolytic in-process dressing. Annals of CIRP 39 1 (1990) 329-332
    • (1990) Annals of CIRP , vol.39 , Issue.1 , pp. 329-332
    • Ohmori, H.1    Nakagawa, T.2
  • 14
    • 0030415248 scopus 로고    scopus 로고
    • Grinding characteristics of hard and brittle materials by fine grain lapping wheels with ELID
    • Itoh N., and Ohmori H. Grinding characteristics of hard and brittle materials by fine grain lapping wheels with ELID. Journal of Materials Processing Technology 62 4 (1996) 315-320
    • (1996) Journal of Materials Processing Technology , vol.62 , Issue.4 , pp. 315-320
    • Itoh, N.1    Ohmori, H.2
  • 15
    • 33845384280 scopus 로고    scopus 로고
    • Y. Chang, Y.T. Hung, J.H. Tsai, C.L. Chao, S.C. Chang, T.H. Lin, Y.P. Chiu, C.C. Wang, Si-O-Si bonding configurations of damaged layer formed after diamond grinding and chemomechanical polishing of Si wafers, in: Proceedings of International Symposium on Advances in Abrasive Technology, NSW Australia, July 8-10, 1997, pp. 38-42.
  • 16
    • 33845436503 scopus 로고    scopus 로고
    • I.D. Marinescu, C. Miyakawa, H. Ohmori, J. Shibata, ELID grinding characteristics of silicon wafer, in: Proceedings of the first International Conference of Precision Engineering Nanotechnology 1 (1999) 380-383.
  • 17
    • 30544451744 scopus 로고    scopus 로고
    • M.M. Islam, A.S. Kumar, S. Balakumar, H.S. Lim, M. Rahman, Advanced ELID process development for grinding silicon wafers, in: Proceedings of Materials Research Society Symposium, Vol. 867, 2005, pp. 97-104.
  • 20
    • 33646495399 scopus 로고    scopus 로고
    • A study on wear mechanism and wear reduction strategies in grinding wheels used for ELID grinding
    • Fathima K., Kumar A.S., Rahman M., and Lim H.S. A study on wear mechanism and wear reduction strategies in grinding wheels used for ELID grinding. Wear 254 12 (2003) 1247-1255
    • (2003) Wear , vol.254 , Issue.12 , pp. 1247-1255
    • Fathima, K.1    Kumar, A.S.2    Rahman, M.3    Lim, H.S.4
  • 21
    • 3042638093 scopus 로고    scopus 로고
    • Development of metal-free conductive bonded diamond wheel for environmentally-friendly electrolytic in-process dressing (ELID) grinding
    • Itoh N., and Ohmori H. Development of metal-free conductive bonded diamond wheel for environmentally-friendly electrolytic in-process dressing (ELID) grinding. New Diamond and Frontier Carbon Technology 14 4 (2004) 227-238
    • (2004) New Diamond and Frontier Carbon Technology , vol.14 , Issue.4 , pp. 227-238
    • Itoh, N.1    Ohmori, H.2
  • 22
    • 0346937186 scopus 로고    scopus 로고
    • Nano finish grinding of brittle materials using electrolytic in-process dressing (ELID) technique
    • Rahman M., Kumar A.S., Lim H.S., and Fatima K. Nano finish grinding of brittle materials using electrolytic in-process dressing (ELID) technique. Sadhana 28 5 (2003) 957-974
    • (2003) Sadhana , vol.28 , Issue.5 , pp. 957-974
    • Rahman, M.1    Kumar, A.S.2    Lim, H.S.3    Fatima, K.4
  • 23
    • 33845409502 scopus 로고    scopus 로고
    • H. Ohmori, N. Itoh, T. Kasai, T. Karaki-Doy, K. Horio, T. Uno, M. Ishii, Metal-resin bond grindstone and method for manufacturing the same, US Patent 6,203,589, 2001.
  • 24
    • 33845439690 scopus 로고    scopus 로고
    • H. Ohmori, Apparatus and method for ELID grinding a large-diameter workpiece to produce a mirror surface finish, US Patent 6,537,139, 2003.
  • 25
    • 33746353107 scopus 로고    scopus 로고
    • Z.C. Li, Z.J. Pei, G.R. Fisher, Simultaneous double side grinding of silicon wafers: a literature review, in press. International Journal of Machine Tools and Manufacture, available at: doi:10.1016/j.ijmachtools.2005.09.011.
  • 27
    • 33845418621 scopus 로고    scopus 로고
    • H. Lundt, M. Kerstan, A. Huber, P.O. Hahn, Subsurface damage of abraded silicon wafers, in: Proceedings of Seventh International Symposium on Silicon Materials Science and Technology, The Electrochemical Society, Pennington, NJ 94-10, 1994, pp. 218-224.
  • 31
    • 29244434820 scopus 로고    scopus 로고
    • A grinding-based manufacturing method for silicon wafers: generation mechanisms of central dimples on ground wafers
    • Zhang X.H., Pei Z.J., and Fisher G.R. A grinding-based manufacturing method for silicon wafers: generation mechanisms of central dimples on ground wafers. International Journal of Machine Tools and Manufacture 46 3-4 (2006) 397-403
    • (2006) International Journal of Machine Tools and Manufacture , vol.46 , Issue.3-4 , pp. 397-403
    • Zhang, X.H.1    Pei, Z.J.2    Fisher, G.R.3
  • 32
    • 33845440144 scopus 로고    scopus 로고
    • M. Kulkarni, A. Desai, Silicon wafering process flow, US Patent 6,294,469, 2001.
  • 33
    • 0035456947 scopus 로고    scopus 로고
    • A comparative study between total thickness variance and site flatness of polished silicon wafer
    • Oh H.S., and Lee H.L. A comparative study between total thickness variance and site flatness of polished silicon wafer. Japanese Journal of Applied Physics 40 (2001) 5300-5301
    • (2001) Japanese Journal of Applied Physics , vol.40 , pp. 5300-5301
    • Oh, H.S.1    Lee, H.L.2
  • 34
    • 33845399219 scopus 로고    scopus 로고
    • SEMI, Specifications for Polished Mono-crystalline Silicon Wafers, SEMI M1-0600, Semiconductor Equipment and Materials International, San Jose, CA, 2000.
  • 35
    • 33845402847 scopus 로고    scopus 로고
    • Disco Website, 〈http://www.disco.co.jp〉.
  • 36
    • 33845385463 scopus 로고    scopus 로고
    • G&N Website, 〈http://www.grinders.de/e-index.htm〉.
  • 37
    • 33845426577 scopus 로고    scopus 로고
    • Koyo Website, 〈http://www.crystec.com/kllovere.htm〉.
  • 38
    • 33845391695 scopus 로고    scopus 로고
    • Okamoto Website, 〈http://www.okamoto-sed.com/index.html〉.
  • 39
    • 33845449279 scopus 로고    scopus 로고
    • Strasbaugh Website, 〈http://www.strasbaugh.com/about.cfm〉.
  • 40
    • 0037285437 scopus 로고    scopus 로고
    • Friction and wear properties of an ELID-grinding wheel based on CCD microscope observation
    • Kato T., Ohmori H., Katahira K., Itoh N., Mituishi N., and Nemoto A. Friction and wear properties of an ELID-grinding wheel based on CCD microscope observation. Key Engineering Materials 238-239 (2003) 307-312
    • (2003) Key Engineering Materials , vol.238-239 , pp. 307-312
    • Kato, T.1    Ohmori, H.2    Katahira, K.3    Itoh, N.4    Mituishi, N.5    Nemoto, A.6
  • 41
    • 33845401520 scopus 로고    scopus 로고
    • Asahi Diamond Industrial, 2000, "Diamond & CBN wheels," retrieved from: 〈http://www.asahidia.co.jp/pdf/B07.pdf〉.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.