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Volumn 46, Issue 3-4, 2006, Pages 397-403

A grinding-based manufacturing method for silicon wafers: Generation mechanisms of central dimples on ground wafers

Author keywords

Grinding; Lapping; Machining; Manufacturing; Material removal; Semiconductor material; Silicon wafer

Indexed keywords

ELASTIC MODULI; FINITE ELEMENT METHOD; INTEGRATED CIRCUITS; LAPPING; MATHEMATICAL MODELS; SILICON WAFERS;

EID: 29244434820     PISSN: 08906955     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijmachtools.2005.05.008     Document Type: Article
Times cited : (24)

References (14)
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  • 3
    • 29244479402 scopus 로고    scopus 로고
    • Silicon shipments, revenues rise
    • 2/9/2005
    • Online Staff, Silicon shipments, revenues rise, Electronic News, 2/9/2005, 2005, available: http://www.reed-electronics.com/electronicnews/ article/CA502571.
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    • Global semi sales hit record high
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    • Online Staff, Global semi sales hit record high, Electronic News, 1/31/2005, 2005, available: http://www.reed-electronics.com/electronicnews/ article/CA500270.
    • (2005) Electronic News
  • 5
    • 29244476704 scopus 로고    scopus 로고
    • Silicon wafering process flow, US Patent 6,294,469
    • M. Kulkarni, A. Desai, Silicon wafering process flow, US Patent 6,294,469, 2001.
    • (2001)
    • Kulkarni, M.1    Desai, A.2
  • 6
    • 0035456947 scopus 로고    scopus 로고
    • A comparative study between total thickness variance and site flatness of polished silicon wafer
    • H.S. Oh, and H.L. Lee A comparative study between total thickness variance and site flatness of polished silicon wafer Japanese Journal of Applied Physics 40 1 2001 5300 5301
    • (2001) Japanese Journal of Applied Physics , vol.40 , Issue.1 , pp. 5300-5301
    • Oh, H.S.1    Lee, H.L.2
  • 7
    • 0032659647 scopus 로고    scopus 로고
    • Materials quality and materials cost - Are they on a collision course?
    • K.V. Ravi, Materials quality and materials cost - are they on a collision course? Solid State Phenomena 69-70 1999 103 110
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    • Ravi, K.V.1
  • 9
  • 10
    • 29244477391 scopus 로고    scopus 로고
    • Method of manufacturing semiconductor mirror wafers, European Patent Application EP96111698.5
    • T. Fukami, H. Masumura, K. Suzuki, H. Kudo, Method of manufacturing semiconductor mirror wafers, European Patent Application EP96111698.5, 1997.
    • (1997)
    • Fukami, T.1    Masumura, H.2    Suzuki, K.3    Kudo, H.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.