Vertical profile control in ultrahigh-aspect-ratio contact hole etching with 0.05-μm-diameter range

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 4 SUPPL. B, 1998, Pages 2337-2342

  Ikegami, Naokatsu ^a   Yabata, Atsushi ^a   Liu, Guo Lin ^a   Uchida, Hidetsugu ^a   Hirashita, Norio ^a   Kanamori, Jun ^a  

^a OKI ELECTRIC INDUSTRY CO   (Japan)

Author keywords

C4F8 O2 Ar; CHF3 CO; Contact hole etching; Dipole ring magnetron; High aspect ratio; High density plasma; Reactive ion etching; Secondary ion mass spectrometry; Vertical profile

Indexed keywords

ASPECT RATIO; DEPOSITION; POLYMERS; SECONDARY ION MASS SPECTROMETRY;

CONTACT HOLE ETCHING; MAGNETRON REACTIVE ION ETCHING (MRIE); ULTRAHIGH ASPECT RATIO;

REACTIVE ION ETCHING;

EID: 0032050606     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.2337     Document Type: Article

References (10)

1. N. Ikegami, A. Yabata, T. Matsui, J. Kanamori and Y. Horiike: Proc. 18th Symp. Dry Process (The Institute of Electrical Engineers, Tokyo, 1996) p. 147.
2. N. Ikegami, A. Yabata, T. Matsui, J. Kanamori and Y. Horiike: Jpn. J. Appl. Phys. 36 (1997) 2470.
3. G. L. Liu, I. Aikawa, T. Koseki, N. Ikegami, H. Uchida, N. Hirashita and J. Kanamori: Proc. 19th Symp. Dry Process (The Institute of Electrical Engineers, Tokyo, 1997) p. 373.
4. G. L. Liu, N. Ikegami, H. Uchida, N. Hirashita and J. Kanamori: submitted to J. Vac. Sci. & Technol. B.
5. J. H. Hunter, Jr., S. F. Corcoran, D. P. Griffins and C. M. Osburn: J. Vac. Sci. & Technol. A8 (1990) 2323.
6. J. Takekawa, H. Ita, Y. Morikawa, N. Hirashita T. Ichiki and Y. Horiike: Ext. Abstr. 44th Spring Meet. No. 2 (The Japan Society of Applied Physics, Tokyo, 1997) p. 547 [in Japanese].
7. H. F. Winters: J. Appl. Phys. 64 (1988) 2805.
8. N. Ikegami, Y. Miyakawa, J. Hashimoto, N. Ozawa and J. Kanamori: Jpn. J. Appl. Phys. 32 (1993) 6088.
9. K. Kubota, H. Matsumoto, H. Shindo, S. Shingubara and H. Horiike: Jpn. J. Appl. Phys. 34 (1995) 2119.
10. N. Hirashita, Y. Miyakawa, K. Fujita and J. Kanamori: Jpn. J. Appl. Phys. 34 (1995) 2137.