Ortho and para interstitial H2 in silicon

Physical Review Letters

Volumn 89, Issue 21, 2002, Pages 2155011-2155014

  Lavrov, Edward V ^a,b   Weber, J ^a  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b INSTITUTE OF RADIO ENGINEERING AND ELECTRONICS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; ELECTRON ENERGY LEVELS; HYDROGEN; QUANTUM THEORY; RAMAN SCATTERING; SILICON; SPECTRUM ANALYSIS;

NUCLEAR SPIN STATES;

MOLECULAR PHYSICS;

EID: 0037132328     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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