Simulation of optical lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3729, Issue , 1999, Pages 480-494

  Erdmann, Andreas ^a   Henke, Wolfgang ^a  

^a FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRONIC EQUIPMENT MANUFACTURE; MICROELECTRONIC PROCESSING; OPTICAL DEVICES; SEMICONDUCTOR DEVICE MANUFACTURE; SIMULATORS;

MICROOPTICAL COMPONENTS; SEMICONDUCTOR INDUSTRY;

PHOTOLITHOGRAPHY;

EID: 0032666685     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (33)