Effects of model polymer chain architectures of photo-resists on line-edge-roughness: Monte Carlo simulations

Journal of Physics: Conference Series

Volumn 10, Issue 1, 2005, Pages 389-392

  Patsis, G P ^a   Gogolides, E ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 22544435244     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/10/1/095     Document Type: Article

References (8)

1. Patsis G P, Constantoudis V, Tserepi A, Gogolides E, Grozev G and Hoffmann T 2003 Microelectron. Eng. 67-68 319
2. Patsis G P, Constantoudis V, Tserepi A, Gogolides E and Grozev G 2003 J. Vac. Sci. Technol. B 21 1008
3. Patsis G P, Tserepi A and Gogolides E 2003 J. Vac. Sci. Technol. B 21 1019
4. Eder-Kapl S, Loeschner H, Zeininger M, Kirch O, Patsis G P, Constantoudis V and Gogolides E 2004 Microelectron. Eng. 73-74 252
5. Constantoudis V, Patsis G P and Gogolides E 2004 J. Microlith. Microfab., Microsyst. 3 429
6. Constantoudis V, Patsis G P, Leunissen L H A and Gogolides E 2004 J. Vac. Sci. Technol. B 22 1974
7. Patsis G P, Constantoudis V and Gogolides E 2004 Microelectron. Eng. 75 (3) 297
8. Tsiartas P C, Flanagin L W, Henderson C L, Hinsberg W D, Sanchez I C, Bonnecaze R T and Willson C G 1997 Macromolecules 30 4656