Precise proximity correction for fabricating chirped diffraction gratings with the direct-writing electron-beam lithography

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4440, Issue , 2001, Pages 268-276

  Okano, Masato ^a   Yotsuya, Tsutom ^a   Hirai, Yoshihiko ^b   Kikuta, Hisao ^b   Yamamoto, Kazuya ^c  

^a OSAKA SCIENCE AND TECHNOLOGY CENTER   (Japan)

^b Osaka Prefecture University   (Japan)

^c NALUX Co Ltd   (Japan)

Author keywords

Diffraction gratings; Electron beam lithography; Proximity correction; Resist development simulator

Indexed keywords

DIFFRACTIVE OPTICS; ELECTRON BEAM LITHOGRAPHY; ELECTRON SCATTERING; ENERGY ABSORPTION; INTERPOLATION; MONTE CARLO METHODS; SIMULATORS;

PROXIMITY CORRECTIONS;

DIFFRACTION GRATINGS;

EID: 0035760027     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.448048     Document Type: Article

References (11)

1. T. Fujita, H. Nishihara and J. Koyama: "Fabrication of microlenses using electron-beam lithography," Opt. Lett. 6 (1981) 613-615.
2. T. Shiono and H. Ogawa: "Diffraction-limited blazed reflection diffractive microlenses for oblique incidence fabricated by electron-beam lithography," Appl. Opt. 30 (1991) 3643-3649.
3. E. Di Fabrizio, L. Grella, M. Baciocchi, M. Gentili, D. Peschiaroli, L. Mastrogiacomo and R. Maggiora: "One step electron-beam lithography for multipurpose diffractive optical elements with 200nm resolution," J. Vac. Sci. Technol. B14 (1996) 3855-3859.
4. E.-B. Kley: "Continuous profile writing by electron and optical lithography," Microel. Eng. 34 (1997) 261-298.
5. W. Daschner, M. Larsson and S.H. Lee: "Fabrication of monolithic diffractive optical elements by the use of e-beam direct write on an analog resist and a single chemically assisted ion-beam-etching step," Appl. Opt. 34 (1995) 2534-2539.
6. P.D. Maker and R.E. Muller: "Phase holograms in polymethyl methacrylate," J. Vac. Sci. Technol. B10 (1992) 2516-2519.
7. F. Nikolajeff, J. Bengtsson, M. Larsson, M. Ekberg and S. Hard: "Measuring and modeling the proximity effect in direct-write electron-beam lithography kinoforms," Appl. Opt. 34 (1995) 897-903.
8. Y. Hirai, H. Kikuta, M. Okano, T. Yotsuya and K. Yamamoto: "Automatic dose optimization system for resist cross-sectional profile in a electron beam lithography," Jpn. J. Appl. Phys. 39 (2000) 6831-6835.
9. D.F. Kyser and K. Murata: "Quantitive electron microprobe analysis of thin films on substrate," IBM J. Res. Develop. 18 (1974) 352-363.
10. F.H. Dill, A.R. Neureuther, J.A. Tuttle and E.J. Walker: "Modeling projection printing of positive photoresists," IEEE Trans. Elec. Dev. ED-22 (1975) 456-464.
11. A.R. Neureuther, D.F. Kyser and C.H. Ting: "Electron-beam resist edge profile simulation," IEEE Trans. Elec. Dev. ED-26 (1979) 686-693.