Reduction in roughness of resist features in PMMA due to the absence of a rinse

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 10, 2004, Pages 6984-6987

  Yasin, Shazia ^a   Khalid, Mohammad N ^b   Hasko, David G ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b HITACHI CAMBRIDGE LABORATORY   (United Kingdom)

Author keywords

E beam; Phase separation; PMMA; Surface roughness

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON BEAMS; IMAGE QUALITY; PHASE SEPARATION; REDUCTION; SILICON WAFERS; SOLVENTS; SURFACE ROUGHNESS;

LINE EDGE ROUGHNESS (LER); POLYMERIC RESIST FILMS; RESIST COMPONENTS; SCALING ANALYSIS;

POLYMETHYL METHACRYLATES;

EID: 10844239603     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.6984     Document Type: Article

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