Non-destructive depth profile analysis using synchrotron radiation excited XPS

Microchimica Acta

Volumn 156, Issue 1-2, 2006, Pages 99-101

  Zier, Michael ^a   Oswald, Steffen ^a   Reiche, Rainer ^a   Wetzig, Klaus ^a  

^a IFW DRESDEN   (Germany)

Author keywords

Depth profile analysis; Non destructive; Segregation; Synchrotron radiation; XPS

Indexed keywords

EID: 33751399490     PISSN: 00263672     EISSN: 14365073     Source Type: Journal    
DOI: 10.1007/s00604-006-0615-9     Document Type: Conference Paper

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