Quantitative ARXPS investigation of systems with ultrathin aluminium oxide layers

Surface and Interface Analysis

Volumn 36, Issue 13, 2004, Pages 1600-1608

  Kozlowska M ^a   Reiche, R ^a   Oswald, S ^a   Vinzelberg, H ^a   Hubner R ^a   Wetzig, K ^a  

^a IFW DRESDEN   (Germany)

Author keywords

Aluminium oxide; ARXPS; ECR oxidation; Model calculation; XRR

Indexed keywords

ALGORITHMS; MATHEMATICAL MODELS; MOLECULAR STRUCTURE; OPTIMIZATION; OXIDATION; ULTRATHIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ALUMINUM OXIDE; ARXPS; ECR OXIDATION; MODEL CALCULATION;

ALUMINUM COMPOUNDS;

EID: 11144253633     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1988     Document Type: Article

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