XPS depth profiling of powdered materials

Applied Surface Science

Volumn 144-145, Issue , 1999, Pages 21-25

  Shimada, H ^a   Sato, K ^a,b   Matsubayashi, N ^a   Imamura, M ^a   Saito, T ^c   Furuya, K ^c  

^a NATL INST OF MAT AND CHEM RES   (Japan)

^b Petroleum Energy Center   (Japan)

^c TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

Attenuation length; Depth profiling; Sputtering; X ray photoelectron spectroscopy; Zeolite

Indexed keywords

ALUMINUM; PHOTOIONIZATION; POWDERS; SILICON; SPUTTERING; SURFACE ROUGHNESS; SURFACE STRUCTURE; ZEOLITES;

DEPTH PROFILING; SURFACE ANALYSIS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 3142547560     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00756-9     Document Type: Article

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