Optoelectronic properties of nitrogenated amorphous carbon films synthesized by microwave surface wave plasma chemical vapor deposition system

Diamond and Related Materials

Volumn 15, Issue 11-12 SPEC. ISS., 2006, Pages 1894-1897

  Adhikari, Sudip ^a   Aryal, Hare Ram ^a   Ghimire, Dilip C ^a   Omer, Ashraf M M ^a   Adhikary, Sunil ^b   Uchida, Hideo ^a   Umeno, Masayoshi ^a  

^a CHUBU UNIVERSITY   (Japan)

^b TRIBHUVAN UNIVERSITY   (Nepal)

Author keywords

Amorphous carbon; Microwave surface wave plasma CVD; Nitrogen; Optoelectronic properties

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); NITROGEN; OPTICAL PROPERTIES; PLASMA WAVES; SUBSTRATES; SYNTHESIS (CHEMICAL);

AMORPHOUS CARBON; MICROWAVE SURFACE WAVE PLASMA CVD; OPTOELECTRONIC PROPERTIES;

AMORPHOUS FILMS;

EID: 33751303707     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2006.08.005     Document Type: Article

References (20)

1. Kiyota H., Okano K., Iwasaki T., Izumiya H., Akiba Y., Kurosu T., and Iida M. Jpn. J. Appl. Phys. 30 (1991) 2015
2. Glesener J.W., Morrish A.A., and Snail K.A. J. Appl. Phys. 70 (1991) 5144
3. Rusop M., Mominuzzaman S.M., Soga T., Jimbo T., and Umeno M. Jpn. J. Appl. Phys. 42 (2003) 2339
4. Wang X., Harris H.R., Bouldin K., Temkin H., Gangopadhyay S., Strathman M.D., and West M. J. Appl. Phys. 87 (2000) 621
5. Robertson J., and O'Reilly E.P. Phys. Rev., B 35 (1987) 2946
6. Chen C.W., and Roberson J. Carbon 37 (1999) 839
7. Silva S.R.P., Robertson J., Amaratunga G.A.J., Rafferty B., Brown L.M., Schwan J., Franceschini D.F., and Mariotto G. J. Appl. Phys. 81 (1997) 2626
8. Lazar G., and Lazar I. J. Non-Cryst. Solids 331 (2003) 70
9. Bhattacharyya S., Hietschold M., and Richter F. Diamond Relat. Mater. 9 (2000) 544
10. Nagatsu M., Sano T., Takada N., Toyoda N., Tanga M., and Sugai H. Diamond Relat. Mater. 11 (2002) 976
11. Adhikari S., Adhikary S., Omer A.M.M., Rusop M., Uchida H., Soga T., and Umeno M. Diamond Relat. Mater. 15 (2006) 188
12. Nagatsu M., Xu G., Ghanashev I., Kanoh M., and Sugai H. Plasma Sources Sci. Technol. 6 (1997) 427
13. Kusunoki I., Sakai M., Igari Y., Ishidzuka S., Takami T., Takaoka T., Nishitani-Gamo M., and Ando T. Surf. Sci. 492 (2001) 315
14. Rusop M., Mominuzzaman S.M., Tian X.M., Soga T., Jimbo T., and Umeno M. Appl. Surf. Sci. 197 (2002) 542
15. Kim J.H., Kim Y.H., Choi D.J., and Baik H.K. Thin Solid Films 289 (1996) 79
16. Hartmann J., Schreck M., Baur T., Huber H., Assmann W., Schuler H., Stritzker B., and Rauschenbach B. Diamond Relat. Mater. 17 (1998) 899
17. Tauc J., Grigorovici R., and Vancu A. Phys. Status Solid 15 (1966) 627
18. Hayashi Y., Yu G., Rahman M.M., Krishna K.M., Soga T., Jimbo T., and Umeno M. J. Appl. Phys. 89 (2001) 7924
19. Tamor M.A., and Vassell W.C. J. Appl. Phys. 76 (1994) 3823
20. Clough F.J., Kleinsorge B., Milne W.I., Roberson J., Amaratunga G.A.J., and Roy B.N. Electron. Lett. 32 (1996) 498