Growth and properties of hydrogen-free DLC films deposited by surface-wave-sustained plasma

Diamond and Related Materials

Volumn 16, Issue 1, 2007, Pages 161-166

  Xu, Junqi ^a,b   Fan, Huiqing ^a   Kousaka, Hiroyuki ^c   Umehara, Noritsugu ^c   Diao, Dongfeng ^d   Liu, Weiguo ^b  

^a NORTHWESTERN POLYTECHNICAL UNIVERSITY   (China)

^b XI'AN TECHNOLOGICAL UNIVERSITY   (China)

^c NAGOYA UNIVERSITY   (Japan)

^d XI'AN JIAOTONG UNIVERSITY   (China)

Author keywords

DLC films; Microwave power; Plasma density; Surface wave sustained plasma (SWP)

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARRIER CONCENTRATION; ELECTRIC POTENTIAL; ELLIPSOMETRY; HARDNESS; MICROWAVE POWER TRANSMISSION; MORPHOLOGY; PLASMA DENSITY; VAPOR DEPOSITION;

EXTINCTION COEFFICIENT; GAS PRESSURE; SURFACE PROFILOMETER; SURFACE WAVE SUSTAINED PLASMA (SWP);

DIAMOND LIKE CARBON FILMS;

EID: 33751255081     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2006.04.013     Document Type: Article

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