Effect of microwave power on the electron energy in an electron cyclotron resonance plasma

Vacuum

Volumn 61, Issue 1, 2001, Pages 29-35

  Yoon, S F ^a   Tan, K H ^a   Zhang, Q ^a   Rusli, M ^a   Ahn, J ^a   Valeri, L ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; ELECTRON ENERGY LEVELS; EMISSION SPECTROSCOPY; HYDROGEN; MICROWAVES; PLASMA COLLISION PROCESSES;

ELECTRON CYCLOTRON RESONANCE PLASMAS;

WAVE PLASMA INTERACTIONS;

EID: 0035313671     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(00)00429-2     Document Type: Article

References (10)

1. Rusli, Yoon SF, Yang H, Zhang Q, Ahn J, Fu YL. J Vac Sci Technol A 1998; 16: 572.
2. Alfred G. Cold plasma in material fabrication from fundamental to applications New York: IEEE Press, 1994. p. 107.
3. Outten C.A., Barbour J.C., Wampler W.R. J Vac Sci Technol A. 9(3):1991;717.
4. Popov O.A. J Vac Sci Technol A. 9(3):1991;711.
5. Eddy CR, Leonhardt Jr, Douglass SR, Thoms BD, Shamamian VA, Butler JE, J Vac Sci Technol A 1999; 17(1): 38.
6. Williams J.A. J Phys D: Appl Phys. 7:1974;2205.
7. Pearse RWB, Gaydon AG. The identification of molecular spectra. Chapman & Hall, London, 1976. p. 170.
8. Hyman E., Tsang K., Drobot A., Lane B., Casey J., Post R. J Vac Sci Technol A. 12(4):1994;1474.
9. Brian C. Glow discharge processes. Sputtering and plasma etching. New York: Wiley, 1980, p.21.
10. Brown SC. Basic data of plasma physics. Cambridge, MA: The MIT Press, 1966, p.131.