Sputtering of Al-Cr and Al-Ti composite targets in pure Ar and in reactive Ar-N2 plasmas

Surface and Coatings Technology

Volumn 96, Issue 2-3, 1997, Pages 184-190

  Sanchette, F ^a   Czerwiec, T ^a   Billard, A ^a   Frantz, C ^a  

^a INSTITUT JEAN LAMOUR   (France)

Author keywords

Al Ti N; Composite target; Computer simulation; Reactive sputtering

Indexed keywords

ALUMINUM ALLOYS; ARGON; COMPOSITION EFFECTS; COMPUTER SIMULATION; CURRENT DENSITY; NITRIDING; NITROGEN; OPTICAL MICROSCOPY; PLASMA DIAGNOSTICS;

COMPOSITE TARGET; REACTIVE MAGNETRON SPUTTERING;

MAGNETRON SPUTTERING;

EID: 0031268514     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00110-2     Document Type: Article

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