Real-time monitoring of charge accumulation during pulse-time-modulated plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 6, 2006, Pages 2172-2175

  Ohtake, Hiroto ^a   Jinnai, Butsurin ^a   Suzuki, Yuya ^a   Soda, Shinnosuke ^a   Shimmura, Tadashi ^a   Samukawa, Seiji ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

PLASMA APPLICATIONS; PLASMAS; SILICA; SILICON WAFERS;

CHARGE ACCUMULATION; ELECTRON SHADING EFFECTS; ON-WAFER MONITORING;

CARRIER CONCENTRATION;

EID: 33750964868     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2362724     Document Type: Article

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