Reactive sputter-deposition of AlN films by dense plasma focus

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 6, 2006, Pages 2122-2127

  Sadiq, Mehboob ^a   Ahmad, S ^a   Shafiq, M ^a   Zakaullah, M ^a   Ahmad, R ^b   Waheed, A ^c  

^a QUAID I AZAM UNIVERSITY   (Pakistan)

^b GC UNIVERSITY   (Pakistan)

^c PAKISTAN INSTITUTE OF NUCLEAR SCIENCE AND TECHNOLOGY   (Pakistan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM NITRIDE; ANODES; MICROHARDNESS; PLASMA APPLICATIONS; RAMAN SPECTROSCOPY; SILICON; SPUTTER DEPOSITION; X RAY DIFFRACTION ANALYSIS;

CRYSTALLINITY; PLASMA FOCUS DEVICES; ROOM TEMPERATURE; SILICON SUBSTRATES;

THIN FILMS;

EID: 33750956015     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2357743     Document Type: Article

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