Small angle X-ray scattering measurements of porous low-k films using synchrotron radiation

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 2410-2414

  Suzuki, Takashi ^a   Omote, Kazuhiko ^b   Ito, Yoshiyasu ^b   Hirosawa, Ichiro ^c   Nakata, Yoshihiro ^a   Sugiura, Iwao ^a   Shimizu, Noriyoshi ^a   Nakamura, Tomoji ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

^b RIGAKU CORPORATION   (Japan)

^c JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

Author keywords

Dielectrics; Nanostructures; Positron spectroscopy; X ray scattering

Indexed keywords

POSITRON ANNIHILATION SPECTROSCOPY; SPECTROSCOPIC ANALYSIS; SYNCHROTRON RADIATION; X RAY SCATTERING;

LOW-K FILMS; SMALL ANGLE X-RAY SCATTERING (SAXS) TECHNIQUE; SPIN ON GLASS (SOG) FILMS;

DIELECTRIC FILMS;

EID: 33750817627     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.05.012     Document Type: Article

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