Magnetotransport properties of Ge channels with extremely high compressive strain

Applied Physics Letters

Volumn 89, Issue 16, 2006, Pages

  Sawano, K ^a   Kunishi, Y ^a   Shiraki, Y ^a   Toyama, K ^b   Okamoto, T ^b   Usami, N ^c   Nakagawa, K ^d  

^a TOKYO CITY UNIVERSITY   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

^c TOHOKU UNIVERSITY   (Japan)

^d UNIVERSITY OF YAMANASHI   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPRESSIVE STRENGTH; IMPURITIES; MAGNETIC PROPERTIES; MOS DEVICES; SEMICONDUCTOR MATERIALS; TRANSPORT PROPERTIES;

HOLE DENSITY; IMPURITY SCATTERING; MAGNETOTRANSPORT PROPERTIES;

GERMANIUM;

EID: 33750196699     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2354467     Document Type: Article

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